LIU, D.; SI, L.-C. Optimizing Digital Art Style Transfer Using a Diffusion Model. Advanced Electromagnetics, [S. l.], v. 15, n. 3, p. 4825–4837, 2026. DOI: 10.7716/aem.v15i3.3546. Disponível em: https://www.aemjournal.org/index.php/AEM/article/view/3546. Acesso em: 20 sep. 2026.